SNPS » Topics » Manufacturing Solutions

These excerpts taken from the SNPS 10-K filed Dec 22, 2008.

Manufacturing Solutions

        Our Manufacturing Solutions products and technologies address the mask-making and yield enhancement of very small geometry IC, as well as very high-level modeling of physical effects within the ICs. Our Manufacturing Solutions grouping includes the following products:

    Technology-CAD or TCAD products, which precisely model individual structures or devices within an IC design to improve manufacturability at small geometries. We see TCAD tools as increasingly important to help customers shorten the time to ramp up their production yields, and therefore reduce their manufacturing costs.

    Proteus OPC/InPhase optical proximity correction (OPC) products which embed and verify corrective features in an IC design and masks to improve manufacturing results for subwavelength feature width designs. OPC products change mask features to compensate for distortions caused by optical diffraction and resist process effects.

    CATS® mask data preparation product that takes a final IC design and "fractures" it into the physical features that will be included in the photomasks to be used in manufacturing.

    Yield Management products allow access to fab data to help accelerate the process by which customers identify, characterize and eliminate sources of failure throughout the design process.

Manufacturing Solutions





        Our Manufacturing Solutions products and technologies address the mask-making and yield enhancement of very small geometry
IC, as well as very high-level modeling of physical effects within the ICs. Our Manufacturing Solutions grouping includes the following products:





    Technology-CAD or TCAD products, which precisely model
    individual structures or devices within an IC design to improve manufacturability at small geometries. We see TCAD tools as increasingly important to help customers shorten the time to
    ramp up their production yields, and therefore reduce their manufacturing costs.



    Proteus OPC/InPhase optical proximity correction (OPC) products which
    embed and verify corrective features in an IC design and masks to improve manufacturing results for subwavelength feature width designs. OPC products change mask features to compensate for distortions
    caused by optical diffraction and resist process effects.



    CATS® mask data preparation product that takes a final IC
    design and "fractures" it into the physical features that will be included in the photomasks to be used in manufacturing.



    Yield Management products allow access to fab data to help accelerate the
    process by which customers identify, characterize and eliminate sources of failure throughout the design process.



EXCERPTS ON THIS PAGE:

10-K (2 sections)
Dec 22, 2008
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